Impact of High Temperature Up to 175 ^ C on the DC and RF Performances of 22-nm FD-SOI MOSFETs

In this work, the effect of rise in temperature from 25 ^{\circ} C to 175 ^{\circ} C on the performance of 22-nm fully depleted silicon-on-insulator (FD-SOI) MOSFETs is studied under different bias conditions. The devices are measured in dc and RF to observe the zero-temperature coefficient (ZTC)...

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Veröffentlicht in:IEEE transactions on electron devices 2023-10, Vol.70 (10), p.1-6
Hauptverfasser: Halder, Arka, Nyssens, Lucas, Vanbrabant, Martin, Rack, Martin, Lederer, Dimitri, Kilchytska, Valeriya, Raskin, Jean-Pierre
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Sprache:eng
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Zusammenfassung:In this work, the effect of rise in temperature from 25 ^{\circ} C to 175 ^{\circ} C on the performance of 22-nm fully depleted silicon-on-insulator (FD-SOI) MOSFETs is studied under different bias conditions. The devices are measured in dc and RF to observe the zero-temperature coefficient (ZTC) point and extract the prominent RF figures of merit (FoMs), i.e., current-gain cutoff frequency ( f _{\textit{T}} ) and maximum oscillation frequency ( f _{\text{max}} ). The evolution of transconductance ( g _{\textit{m}} ) with temperature appears to be one of the major causes of the 20% degradation in peak f _{\textit{T}} and f _{\text{max}} at 175 ^{\circ} C. From a low-power application point of view, stepping down V _{\textit{d}} from 0.8 to 0.6 V decreases the magnitude of peak f _{\textit{T}} and f _{\text{max}} degradation to around 7%-10%, respectively, over the given temperature range while reducing static power consumption ( P _{\text{dc}} ) around 29%. Furthermore, the variation of f _{\textit{T}} and f _{\text{max}} at and below the g _{\textit{m}} -ZTC is investigated. Below the g _{\textit{m}} -ZTC point, at a front-gate bias V _{\textit{g}} of 0.3 V, an improvement in f _{\textit{T}}
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2023.3303150