Silicon micromachined RF MEMS resonators
A new resonator concept based on a three dimensional (3D) high resistivity silicon substrate filled cavity resonators is investigated. Fabrication is done using micromachining technologies. Two types of resonators are investigated, an "open-end" patch resonator and a "short circuit vi...
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| creator | Strohm, K.M. Schmuckle, F.J. Schauwecker, B. Luy, J.-F. Heinrich, W. |
| description | A new resonator concept based on a three dimensional (3D) high resistivity silicon substrate filled cavity resonators is investigated. Fabrication is done using micromachining technologies. Two types of resonators are investigated, an "open-end" patch resonator and a "short circuit via" resonator. Both types show good agreement in simulated and measured resonance frequencies (within 2%). However, measured quality factors (50-70) are still lower than the simulated values and theoretical expectations. |
| doi_str_mv | 10.1109/MWSYM.2002.1011873 |
| format | Conference Proceeding |
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However, measured quality factors (50-70) are still lower than the simulated values and theoretical expectations.</description><subject>Cavity resonators</subject><subject>Circuit simulation</subject><subject>Conductivity</subject><subject>Fabrication</subject><subject>Frequency measurement</subject><subject>Micromachining</subject><subject>Radiofrequency microelectromechanical systems</subject><subject>Resonance</subject><subject>Resonant frequency</subject><subject>Silicon</subject><issn>0149-645X</issn><issn>2576-7216</issn><isbn>9780780372399</isbn><isbn>0780372395</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2002</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotUEtLw0AYXHyAofYP6CUn8ZL67SP7OEppVWgQrKKewnb3W1zJo2bbg__eSDsMDAzDMAwhVxRmlIK5q97Xn9WMAbAZBUq14ickY6WShWJUnpKpURpGcsW4MWckAypMIUX5cUGmKX3DCFGCAZ6R23Vsouu7vI1u6FvrvmKHPn9Z5tWiWucDpr6zu35Il-Q82Cbh9KgT8rZcvM4fi9Xzw9P8flVEBmJXBKUFeG1pQGDWg2LMBe9pCQI1QhBiI2W5QQfWh9KNG8RGOy8DH21GNZ-Qm0Pvduh_9ph2dRuTw6axHfb7VDMljeLyP3h9CEZErLdDbO3wWx8P4X8H81DH</recordid><startdate>2002</startdate><enddate>2002</enddate><creator>Strohm, K.M.</creator><creator>Schmuckle, F.J.</creator><creator>Schauwecker, B.</creator><creator>Luy, J.-F.</creator><creator>Heinrich, W.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>2002</creationdate><title>Silicon micromachined RF MEMS resonators</title><author>Strohm, K.M. ; Schmuckle, F.J. ; Schauwecker, B. ; Luy, J.-F. ; Heinrich, W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i204t-f7840d8a1fe02ad0722cfdd1504e8e0f44b665bec0adf5c9034b8cd6f36652183</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Cavity resonators</topic><topic>Circuit simulation</topic><topic>Conductivity</topic><topic>Fabrication</topic><topic>Frequency measurement</topic><topic>Micromachining</topic><topic>Radiofrequency microelectromechanical systems</topic><topic>Resonance</topic><topic>Resonant frequency</topic><topic>Silicon</topic><toplevel>online_resources</toplevel><creatorcontrib>Strohm, K.M.</creatorcontrib><creatorcontrib>Schmuckle, F.J.</creatorcontrib><creatorcontrib>Schauwecker, B.</creatorcontrib><creatorcontrib>Luy, J.-F.</creatorcontrib><creatorcontrib>Heinrich, W.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Strohm, K.M.</au><au>Schmuckle, F.J.</au><au>Schauwecker, B.</au><au>Luy, J.-F.</au><au>Heinrich, W.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Silicon micromachined RF MEMS resonators</atitle><btitle>2002 IEEE MTT-S International Microwave Symposium Digest (Cat. No.02CH37278)</btitle><stitle>MWSYM</stitle><date>2002</date><risdate>2002</risdate><volume>2</volume><spage>1209</spage><epage>1212 vol.2</epage><pages>1209-1212 vol.2</pages><issn>0149-645X</issn><eissn>2576-7216</eissn><isbn>9780780372399</isbn><isbn>0780372395</isbn><abstract>A new resonator concept based on a three dimensional (3D) high resistivity silicon substrate filled cavity resonators is investigated. Fabrication is done using micromachining technologies. Two types of resonators are investigated, an "open-end" patch resonator and a "short circuit via" resonator. Both types show good agreement in simulated and measured resonance frequencies (within 2%). However, measured quality factors (50-70) are still lower than the simulated values and theoretical expectations.</abstract><pub>IEEE</pub><doi>10.1109/MWSYM.2002.1011873</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | ISSN: 0149-645X |
| ispartof | 2002 IEEE MTT-S International Microwave Symposium Digest (Cat. No.02CH37278), 2002, Vol.2, p.1209-1212 vol.2 |
| issn | 0149-645X 2576-7216 |
| language | eng |
| recordid | cdi_ieee_primary_1011873 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Cavity resonators Circuit simulation Conductivity Fabrication Frequency measurement Micromachining Radiofrequency microelectromechanical systems Resonance Resonant frequency Silicon |
| title | Silicon micromachined RF MEMS resonators |
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