Novel BiCMOS compatible, short channel LDMOS technology for medium voltage RF and power applications
We describe a very short channel, 0.15 /spl mu/m, LDMOS transistor, with a breakdown voltage of up to 45 V, manufactured in a standard 0.35 /spl mu/m BiCMOS process. At 1900 MHz and a 12 V supply voltage the 0.4 mm gate width device gives 100 mW output power P/sub 1/ /sub dB/ at a drain efficiency o...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | We describe a very short channel, 0.15 /spl mu/m, LDMOS transistor, with a breakdown voltage of up to 45 V, manufactured in a standard 0.35 /spl mu/m BiCMOS process. At 1900 MHz and a 12 V supply voltage the 0.4 mm gate width device gives 100 mW output power P/sub 1/ /sub dB/ at a drain efficiency of 43%. It has a transducer power gain of more than 20 dB and a current gain cutoff frequency, f/sub T/, of 13 GHz. The maximum available gain cutoff frequency, f/sub MAX/, is 27 GHz. The LDMOS process module does not affect the performance or models of other devices. We present for the first time a simple way to create high voltage, high performance LDMOS transistors for RF power amplifier use even in a very downscaled silicon technology. |
---|---|
ISSN: | 0149-645X 2576-7216 |
DOI: | 10.1109/MWSYM.2002.1011552 |