Fabrication of RF inductor using patterned FeTaN soft magnetic films

Summary form only given. Recently, RF lumped devices were in strong demand as an RF application especially in the of field of mobile communication. Many workers have been reported an RF integrated inductor as air core type. In order to achieve the high Q-value, backside substrate removing by microma...

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Hauptverfasser: Seok Bae, Dong-Hoon Shin, Chung-Sik Kim, Sung-Ryong Ryu, Seung-Eui Nam, Jae-Sung Song, Yamaguchi, M., Hyoung-June Kim
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Summary form only given. Recently, RF lumped devices were in strong demand as an RF application especially in the of field of mobile communication. Many workers have been reported an RF integrated inductor as air core type. In order to achieve the high Q-value, backside substrate removing by micromachining process and optimization of coil structure by magnetic field simulator were approached. However, this MEMS-like approach is incapable of suppressing the parasitic effects effectively, and involves complex fabrication processes. So, we think that the achievement of high Q was easily realized using a magnetic amplification by magnetic materials. Resonance frequency of inductor was depends on ferro-magnetic resonance (FMR) loss and eddy current loss. Eddy current loss can easily controlled by limitation of thickness. FMR can controlled by stripe patterned magnetic films as increasing of uni-axial shape anisotropy.
DOI:10.1109/INTMAG.2002.1001053