High resolution magnetic patterning using Focused Ion Beam irradiation

We show how Focused Ion Beam irradiation can be used to modify the magnetic properties of a thin Co/Pt layer at a nanometric length-scale. The control of the injected ion dose enables the adjustment of the coercive field and the Curie temperature of the layer on localized parts of the sample. The me...

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Veröffentlicht in:	Microelectronic engineering 2000-06, Vol.53 (1), p.191-194
Hauptverfasser:	Vieu, C., Gierak, J., Launois, H., Aign, T., Meyer, P., Jamet, J.P., Ferré, J., Chappert, C., Mathet, V., Bernas, H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Integrated circuits Lithography, masks and pattern transfer Microelectronic fabrication (materials and surfaces technology) Microelectronics: LSI, VLSI, ULSI integrated circuit fabrication technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Zusammenfassung:	We show how Focused Ion Beam irradiation can be used to modify the magnetic properties of a thin Co/Pt layer at a nanometric length-scale. The control of the injected ion dose enables the adjustment of the coercive field and the Curie temperature of the layer on localized parts of the sample. The mechanism induced during irradiation is identified as a collisional mixing process which incorporates some Pt into the Co layer thus lowering the Curie temperature. The ultimate resolution of this magnetic patterning technique is discussed.
ISSN:	0167-9317 1873-5568
DOI:	10.1016/S0167-9317(00)00294-X