Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes-Based Plasma Polymer Films

This paper aims at describing the synthesis of plasma polymer films by means of atmospheric filamentary plasma dielectric barrier discharge. This work highlights the fact that molecular structures of siloxane based plasma films can be tuned according to the so‐called Yasuda's parameter, which corresponds to the W/F ratios (W = power discharge; F = Monomer flow rate). Indeed, we showed that the plasma films exhibit a polydimethylsiloxane (PDMS) structure when W/F was low (i.e. when low plasma energy is applied), whereas SiOx structures were rather obtained when W/F is high (i.e. high plasma energy). These results were validated thanks to a wide set of analytical tools allowing to identify two domains where molecular structures of the plasma films swiftly progress from PDMS to SiOx according to W/F ratios. Atmospheric pressure DBD process has been used to tune siloxanes‐based plasma polymer films according to W/F parameter. In the monomer‐sufficient region, HMDSO molecules undergo less fragmentation during plasma polymerization to form a PDMS‐like molecular structure. In the monomer‐deficient region, heavy fragmentation leads to a SiOx structure. This work evidenced that the chemical compositions and wettability properties are related to plasma parameters.