Quantitativeness of phase-field simulations for directional solidification of faceted silicon monograins in thin samples
We report the results of a two-dimensional reference model for the formation of facets on the left and the right side of a silicon monograin that is solidified by pulling a thin sample in a constant temperature gradient. Anisotropy functions of both the surface energy and the kinetic attachment coef...
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Veröffentlicht in: | Physical review. E 2022-10, Vol.106 (4), p.044802-044802, Article 044802 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We report the results of a two-dimensional reference model for the formation of facets on the left and the right side of a silicon monograin that is solidified by pulling a thin sample in a constant temperature gradient. Anisotropy functions of both the surface energy and the kinetic attachment coefficient are adapted from a recent model for free growth of silicon micrometer size grains [Boukellal et al., J. Cryst. Growth 522, 37 (2019)]. More precise estimates of the physical parameters entering these functions are obtained by reanalyzing available experimental results. We show that the reference model leads to a differential equation for the shape of the solid-liquid interface. The numerical solutions of this equation give a reference law Λ(V f) relating the facet length Λ to the facet normal velocity V f. In parallel, phase-field simulations of the reference model are performed for two growth orientations, [001] and [011]. Facet lengths Λ obtained from simulations at different facet velocities are first extrapolated to the limit of vanishing interface width. This extrapolation is made possible by constructing a master curve common to the whole range of V f values considered. The extrapolated Λ values are then compared with the ones predicted by the Λ(V f) reference law. Both sets give comparable values, with an accuracy of a few percent, which confirms that the phase-field model can give quantitative results for faceted solidification of silicon. |
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ISSN: | 2470-0045 2470-0053 |
DOI: | 10.1103/PhysRevE.106.044802 |