Atomic and Molecular Layer Deposition Area Selective Deposition using alternate deposition and etch super-cycle strategies

Atomic and Molecular Layer Deposition Area Selective Deposition using alternate deposition and etch super-cycle strategies

Area Selective Deposition (ASD) is a bottom-up process leading to a uniform deposit in only desired areas of a patterned substrate, avoiding the use of photolithography for patterning. However, whatever...

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Veröffentlicht in:Dalton transactions : an international journal of inorganic chemistry 2021-11
Hauptverfasser: Bonvalot, Marceline, Vallee, Christophe, Mannequin, Cedric, Jaffal, Moustapha, Gassilloud, Remy, Posseme, Nicolas, Chevolleau, Thierry
Format: Artikel
Sprache:eng
Schlagworte:
Physics
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Zusammenfassung:Area Selective Deposition (ASD) is a bottom-up process leading to a uniform deposit in only desired areas of a patterned substrate, avoiding the use of photolithography for patterning. However, whatever...
ISSN:1477-9226
1477-9234
DOI:10.1039/D1DT03456A