Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers

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Veröffentlicht in:ACS applied materials & interfaces 2021-03, Vol.13 (9), p.11224-11236
Hauptverfasser: Chevalier, Xavier, Gomes Correia, Cindy, Pound-Lana, Gwenaelle, Bézard, Philippe, Sérégé, Matthieu, Petit-Etienne, Camille, Gay, Guillaume, Cunge, Gilles, Cabannes-Boué, Benjamin, Nicolet, Célia, Navarro, Christophe, Cayrefourcq, Ian, Müller, Marcus, Hadziioannou, Georges, Iliopoulos, Ilias, Fleury, Guillaume, Zelsmann, Marc
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container_end_page 11236
container_issue 9
container_start_page 11224
container_title ACS applied materials & interfaces
container_volume 13
creator Chevalier, Xavier
Gomes Correia, Cindy
Pound-Lana, Gwenaelle
Bézard, Philippe
Sérégé, Matthieu
Petit-Etienne, Camille
Gay, Guillaume
Cunge, Gilles
Cabannes-Boué, Benjamin
Nicolet, Célia
Navarro, Christophe
Cayrefourcq, Ian
Müller, Marcus
Hadziioannou, Georges
Iliopoulos, Ilias
Fleury, Guillaume
Zelsmann, Marc
description
doi_str_mv 10.1021/acsami.1c00694
format Article
fullrecord <record><control><sourceid>hal</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_03419558v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>oai_HAL_hal_03419558v1</sourcerecordid><originalsourceid>FETCH-hal_primary_oai_HAL_hal_03419558v13</originalsourceid><addsrcrecordid>eNqVzLFOxDAQBFALcRIHR0u9LUUOO3HQpYQAShFRXR8txkmWc7yRnQPlC_g8fokgIXqqGY2eRogrJbdKpuoGTcSBtspIeVvoE7FWhdbJLs3T07-u9Zk4j_FtIVkq87WwNU09dwHHngw6N8ODbcnbVygDx5jU5A_44izseYSScYrQcoBn9DygP7ZopmMg38HH8gMVdX3y9Qn3js1h4SO7ebAhbsSqRRft5W9eiOunx31ZJT26Zgw0YJgbRmqqu7r52WSmVZHnu3eV_cd-AzL5Uk8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers</title><source>American Chemical Society Publications</source><creator>Chevalier, Xavier ; Gomes Correia, Cindy ; Pound-Lana, Gwenaelle ; Bézard, Philippe ; Sérégé, Matthieu ; Petit-Etienne, Camille ; Gay, Guillaume ; Cunge, Gilles ; Cabannes-Boué, Benjamin ; Nicolet, Célia ; Navarro, Christophe ; Cayrefourcq, Ian ; Müller, Marcus ; Hadziioannou, Georges ; Iliopoulos, Ilias ; Fleury, Guillaume ; Zelsmann, Marc</creator><creatorcontrib>Chevalier, Xavier ; Gomes Correia, Cindy ; Pound-Lana, Gwenaelle ; Bézard, Philippe ; Sérégé, Matthieu ; Petit-Etienne, Camille ; Gay, Guillaume ; Cunge, Gilles ; Cabannes-Boué, Benjamin ; Nicolet, Célia ; Navarro, Christophe ; Cayrefourcq, Ian ; Müller, Marcus ; Hadziioannou, Georges ; Iliopoulos, Ilias ; Fleury, Guillaume ; Zelsmann, Marc</creatorcontrib><identifier>ISSN: 1944-8244</identifier><identifier>EISSN: 1944-8252</identifier><identifier>DOI: 10.1021/acsami.1c00694</identifier><language>eng</language><publisher>Washington, D.C. : American Chemical Society</publisher><subject>Engineering Sciences</subject><ispartof>ACS applied materials &amp; interfaces, 2021-03, Vol.13 (9), p.11224-11236</ispartof><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0003-4199-5529 ; 0000-0002-7472-973X ; 0000-0001-7397-7849 ; 0000-0002-7377-6040 ; 0000-0003-0779-191X ; 0000-0002-7377-6040 ; 0000-0003-4199-5529 ; 0000-0003-0779-191X ; 0000-0002-7472-973X ; 0000-0001-7397-7849</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://hal.science/hal-03419558$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Chevalier, Xavier</creatorcontrib><creatorcontrib>Gomes Correia, Cindy</creatorcontrib><creatorcontrib>Pound-Lana, Gwenaelle</creatorcontrib><creatorcontrib>Bézard, Philippe</creatorcontrib><creatorcontrib>Sérégé, Matthieu</creatorcontrib><creatorcontrib>Petit-Etienne, Camille</creatorcontrib><creatorcontrib>Gay, Guillaume</creatorcontrib><creatorcontrib>Cunge, Gilles</creatorcontrib><creatorcontrib>Cabannes-Boué, Benjamin</creatorcontrib><creatorcontrib>Nicolet, Célia</creatorcontrib><creatorcontrib>Navarro, Christophe</creatorcontrib><creatorcontrib>Cayrefourcq, Ian</creatorcontrib><creatorcontrib>Müller, Marcus</creatorcontrib><creatorcontrib>Hadziioannou, Georges</creatorcontrib><creatorcontrib>Iliopoulos, Ilias</creatorcontrib><creatorcontrib>Fleury, Guillaume</creatorcontrib><creatorcontrib>Zelsmann, Marc</creatorcontrib><title>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers</title><title>ACS applied materials &amp; interfaces</title><subject>Engineering Sciences</subject><issn>1944-8244</issn><issn>1944-8252</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqVzLFOxDAQBFALcRIHR0u9LUUOO3HQpYQAShFRXR8txkmWc7yRnQPlC_g8fokgIXqqGY2eRogrJbdKpuoGTcSBtspIeVvoE7FWhdbJLs3T07-u9Zk4j_FtIVkq87WwNU09dwHHngw6N8ODbcnbVygDx5jU5A_44izseYSScYrQcoBn9DygP7ZopmMg38HH8gMVdX3y9Qn3js1h4SO7ebAhbsSqRRft5W9eiOunx31ZJT26Zgw0YJgbRmqqu7r52WSmVZHnu3eV_cd-AzL5Uk8</recordid><startdate>20210310</startdate><enddate>20210310</enddate><creator>Chevalier, Xavier</creator><creator>Gomes Correia, Cindy</creator><creator>Pound-Lana, Gwenaelle</creator><creator>Bézard, Philippe</creator><creator>Sérégé, Matthieu</creator><creator>Petit-Etienne, Camille</creator><creator>Gay, Guillaume</creator><creator>Cunge, Gilles</creator><creator>Cabannes-Boué, Benjamin</creator><creator>Nicolet, Célia</creator><creator>Navarro, Christophe</creator><creator>Cayrefourcq, Ian</creator><creator>Müller, Marcus</creator><creator>Hadziioannou, Georges</creator><creator>Iliopoulos, Ilias</creator><creator>Fleury, Guillaume</creator><creator>Zelsmann, Marc</creator><general>Washington, D.C. : American Chemical Society</general><scope>1XC</scope><orcidid>https://orcid.org/0000-0003-4199-5529</orcidid><orcidid>https://orcid.org/0000-0002-7472-973X</orcidid><orcidid>https://orcid.org/0000-0001-7397-7849</orcidid><orcidid>https://orcid.org/0000-0002-7377-6040</orcidid><orcidid>https://orcid.org/0000-0003-0779-191X</orcidid><orcidid>https://orcid.org/0000-0002-7377-6040</orcidid><orcidid>https://orcid.org/0000-0003-4199-5529</orcidid><orcidid>https://orcid.org/0000-0003-0779-191X</orcidid><orcidid>https://orcid.org/0000-0002-7472-973X</orcidid><orcidid>https://orcid.org/0000-0001-7397-7849</orcidid></search><sort><creationdate>20210310</creationdate><title>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers</title><author>Chevalier, Xavier ; Gomes Correia, Cindy ; Pound-Lana, Gwenaelle ; Bézard, Philippe ; Sérégé, Matthieu ; Petit-Etienne, Camille ; Gay, Guillaume ; Cunge, Gilles ; Cabannes-Boué, Benjamin ; Nicolet, Célia ; Navarro, Christophe ; Cayrefourcq, Ian ; Müller, Marcus ; Hadziioannou, Georges ; Iliopoulos, Ilias ; Fleury, Guillaume ; Zelsmann, Marc</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-hal_primary_oai_HAL_hal_03419558v13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Engineering Sciences</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chevalier, Xavier</creatorcontrib><creatorcontrib>Gomes Correia, Cindy</creatorcontrib><creatorcontrib>Pound-Lana, Gwenaelle</creatorcontrib><creatorcontrib>Bézard, Philippe</creatorcontrib><creatorcontrib>Sérégé, Matthieu</creatorcontrib><creatorcontrib>Petit-Etienne, Camille</creatorcontrib><creatorcontrib>Gay, Guillaume</creatorcontrib><creatorcontrib>Cunge, Gilles</creatorcontrib><creatorcontrib>Cabannes-Boué, Benjamin</creatorcontrib><creatorcontrib>Nicolet, Célia</creatorcontrib><creatorcontrib>Navarro, Christophe</creatorcontrib><creatorcontrib>Cayrefourcq, Ian</creatorcontrib><creatorcontrib>Müller, Marcus</creatorcontrib><creatorcontrib>Hadziioannou, Georges</creatorcontrib><creatorcontrib>Iliopoulos, Ilias</creatorcontrib><creatorcontrib>Fleury, Guillaume</creatorcontrib><creatorcontrib>Zelsmann, Marc</creatorcontrib><collection>Hyper Article en Ligne (HAL)</collection><jtitle>ACS applied materials &amp; interfaces</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chevalier, Xavier</au><au>Gomes Correia, Cindy</au><au>Pound-Lana, Gwenaelle</au><au>Bézard, Philippe</au><au>Sérégé, Matthieu</au><au>Petit-Etienne, Camille</au><au>Gay, Guillaume</au><au>Cunge, Gilles</au><au>Cabannes-Boué, Benjamin</au><au>Nicolet, Célia</au><au>Navarro, Christophe</au><au>Cayrefourcq, Ian</au><au>Müller, Marcus</au><au>Hadziioannou, Georges</au><au>Iliopoulos, Ilias</au><au>Fleury, Guillaume</au><au>Zelsmann, Marc</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers</atitle><jtitle>ACS applied materials &amp; interfaces</jtitle><date>2021-03-10</date><risdate>2021</risdate><volume>13</volume><issue>9</issue><spage>11224</spage><epage>11236</epage><pages>11224-11236</pages><issn>1944-8244</issn><eissn>1944-8252</eissn><pub>Washington, D.C. : American Chemical Society</pub><doi>10.1021/acsami.1c00694</doi><orcidid>https://orcid.org/0000-0003-4199-5529</orcidid><orcidid>https://orcid.org/0000-0002-7472-973X</orcidid><orcidid>https://orcid.org/0000-0001-7397-7849</orcidid><orcidid>https://orcid.org/0000-0002-7377-6040</orcidid><orcidid>https://orcid.org/0000-0003-0779-191X</orcidid><orcidid>https://orcid.org/0000-0002-7377-6040</orcidid><orcidid>https://orcid.org/0000-0003-4199-5529</orcidid><orcidid>https://orcid.org/0000-0003-0779-191X</orcidid><orcidid>https://orcid.org/0000-0002-7472-973X</orcidid><orcidid>https://orcid.org/0000-0001-7397-7849</orcidid></addata></record>
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1944-8252
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subjects Engineering Sciences
title Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T09%3A07%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Lithographically%20Defined%20Cross-Linkable%20Top%20Coats%20for%20Nanomanufacturing%20with%20High-%CF%87%20Block%20Copolymers&rft.jtitle=ACS%20applied%20materials%20&%20interfaces&rft.au=Chevalier,%20Xavier&rft.date=2021-03-10&rft.volume=13&rft.issue=9&rft.spage=11224&rft.epage=11236&rft.pages=11224-11236&rft.issn=1944-8244&rft.eissn=1944-8252&rft_id=info:doi/10.1021/acsami.1c00694&rft_dat=%3Chal%3Eoai_HAL_hal_03419558v1%3C/hal%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true