Multiple Magnetoionic Regimes in Ta/Co20Fe60B20/ HfO2

In Ta/CoFeB/HfO2 stacks a gate voltage drives, in a nonvolatile way, the system from an underoxidized state exhibiting in-plane anisotropy (IPA) to an optimum oxidation level resulting in perpendicular anisotropy (PMA) and further into an overoxidized state with IPA. The IPA → PMA regime is found to...

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Veröffentlicht in:Physical review applied 2021-06, Vol.15 (6)
Hauptverfasser: Pachat, R., Ourdani, D., van Der Jagt, J. W., Syskaki, M.-A., Di Pietro, A., Roussigné, Y., Ono, S., Gabor, M. S., Chérif, M., Durin, G., Langer, J., Belmeguenai, M., Ravelosona, D., Herrera Diez, L
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Sprache:eng
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Zusammenfassung:In Ta/CoFeB/HfO2 stacks a gate voltage drives, in a nonvolatile way, the system from an underoxidized state exhibiting in-plane anisotropy (IPA) to an optimum oxidation level resulting in perpendicular anisotropy (PMA) and further into an overoxidized state with IPA. The IPA → PMA regime is found to be significantly faster than the PMA → IPA regime, while only the latter shows full reversibility under the same gate voltages. The effective damping parameter also shows a marked dependence with gate voltage in the IPA → PMA regime, going from 0.029 to 0.012, and only a modest increase to 0.014 in the PMA → IPA regime. The existence of two magneto-ionic regimes has been linked to a difference in the chemical environment of the anchoring points of oxygen species added to underoxidized or overoxidized layers. Our results show that multiple magneto-ionic regimes can exist in a single device and that their characterization is of great importance for the design of high performance spintronics devices.
ISSN:2331-7019
2331-7019
DOI:10.1103/PhysRevApplied.15.064055