Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure

Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure

The structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3−NH3−H2 gas mixtures at low pressure (P 

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Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 2018-10, Vol.664, p.106-114
Hauptverfasser: Carminati, P., Buffeteau, T., Daugey, N., Chollon, G., Rebillat, F., Jacques, S.
Format: Artikel
Sprache:eng
Schlagworte:
Aminodichloroborane
Boron nitride
Boron trichloride
Chemical Sciences
Crystallization degree
Dichloroborane
Effective precursor
Fourier-transform infrared spectroscopy
Material chemistry
Structural homogeneity
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Beschreibung
Zusammenfassung:The structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3−NH3−H2 gas mixtures at low pressure (P 
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2018.08.020