Original surface morphology of epitaxial NiO layers grown on MgO(1 1 0)

NiO layers of different thickness have been epitaxially grown on a MgO(1 1 0) substrate at various temperatures in the range 700–900°C. Investigations by reflection high energy electron diffraction, atomic force microscopy (AFM) and high resolution transmission electron microscopy (HRTEM) give evide...

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Veröffentlicht in:Journal of crystal growth 2001-04, Vol.224 (3), p.309-315
Hauptverfasser: Warot, B, Snoeck, E, Baulès, P, Ousset, J.C, Casanove, M.J, Dubourg, S, Bobo, J.F
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Sprache:eng
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Zusammenfassung:NiO layers of different thickness have been epitaxially grown on a MgO(1 1 0) substrate at various temperatures in the range 700–900°C. Investigations by reflection high energy electron diffraction, atomic force microscopy (AFM) and high resolution transmission electron microscopy (HRTEM) give evidence for a roof-like morphology of the NiO(1 1 0) surface consisting in (1 0 0) and (0 1 0) facets elongated along the [0 0 1] direction. The period and height of these facets depend on the layer thickness and the deposition temperature. This particular surface configuration is due to a minimization of the surface energy during the growth process.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(01)01017-X