Measurement of As diffusivity in Ni2Si thin films

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Bibliographische Detailangaben
Veröffentlicht in:	Microelectronic engineering 2010-03, Vol.87 (3), p.263-266
Hauptverfasser:	BLUM, I, PORTAVOCE, A, MANGETINCK, D, DAINECHE, R, HOUMMADA, K, LABAR, J. L, CARRON, V, BERNARDINI, J
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cold working, work hardening annealing, quenching, tempering, recovery, and recrystallization textures Condensed Matter Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Heat treatment Materials Science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Production techniques Treatment of materials and its effects on microstructure and properties
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