Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings

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Veröffentlicht in:Surface & coatings technology 2019-11, Vol.378, p.124948, Article 124948
Hauptverfasser: Aissani, Linda, Alhussein, Akram, Nouveau, Corinne, Ghelani, Laala, Zaabat, Mourad
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Sprache:eng
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Engineering Sciences
Mechanics
Mechanics of materials
Physics
Plasma Physics
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container_title Surface & coatings technology
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creator Aissani, Linda
Alhussein, Akram
Nouveau, Corinne
Ghelani, Laala
Zaabat, Mourad
description
doi_str_mv 10.1016/j.surfcoat.2019.124948
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subjects Engineering Sciences
Mechanics
Mechanics of materials
Physics
Plasma Physics
title Influence of film thickness and Ar N2 plasma gas on the structure and performance of sputtered vanadium nitride coatings
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