Properties of chromium thin films deposited in a hollow cathode magnetron powered by pulsed DC or HiPIMS

Pure chromium coatings have been deposited within a hollow cathode powered by means of a pulsed DC or a High Power Impulse Magnetron Sputtering (HiPIMS) supply. The discharge characterization by Optical Emission Spectroscopy (OES) has permitted to highlight that more Cr+ are obtained with the HiPIMS mode. A deposition rate of 28μm/h has been reached in pulsed DC mode and, in this case, the films present a columnar morphology whereas, in HiPIMS mode, a maximum deposition rate of 3μm/h is obtained and the films have a compact morphology. X-ray diffraction (XRD) has shown a transition between {211} to random texture with pulsed DC mode when discharge current increases and a {110} texture for coatings deposited in the HiPIMS mode. The hardness is higher for the films deposited in the HiPIMS mode than for those obtained in the pulsed DC mode (1200HV0.025 and 400HV0.025 respectively). Oxidation resistance investigations show a barrier effect for all coatings. •Deposition of chromium coatings has been performed in a HCM; the use of a pulsed DC or HiPIMS mode have been studied•Ionization of sputtered species is enhanced with HiPIMS mode even in a hollow cathode device•Texture is influenced by the type of power supply, pulsed DC or HiPIMS modes•Coatings elaborated with HiPIMS mode exhibit a dense and compact morphology associated with a higher hardness•Both HiPIMS and pulsed DC coatings resist to oxidation at 1100 °C and can be uses as a protection of Zr substrates