Determination of Residual Stress Fields in a Thermally Grown Oxide under Thermal Cycling Loadings, Using XRD and Raman Spectroscopy — Correlations with Microstructural States

The presence of residual stresses in thermal oxide layers has been recognized for a long time. In the present work, the mechanical fields for chromia oxide are determined either by XRD or Raman spectroscopy. In addition, the microstructure of the chromia films is investigated ant its influence on th...

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Veröffentlicht in:Advanced materials research 2014-01, Vol.996, p.890-895
Hauptverfasser: Tao, Zhao Jun, Grosseau-Poussard, Jean Luc, Panicaud, Benoit, Girault, Patrick, Rakotovao, Felaniaina, Bonnet, Gilles, Guerain, Mathieu
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Sprache:eng
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Zusammenfassung:The presence of residual stresses in thermal oxide layers has been recognized for a long time. In the present work, the mechanical fields for chromia oxide are determined either by XRD or Raman spectroscopy. In addition, the microstructure of the chromia films is investigated ant its influence on the evolution of the stress release processes is analyzed.
ISSN:1022-6680
1662-8985
1662-8985
DOI:10.4028/www.scientific.net/AMR.996.890