Inter-diffusion effects in as-deposited Al/Ni polycrystalline multi-layers

Inter-diffusion effects in as-deposited Al/Ni polycrystalline multi-layers

Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated b...

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Veröffentlicht in:Surface and interface analysis 2008-09, Vol.40 (9), p.1318-1321
Hauptverfasser: Salou, M., Rioual, S., Ben Youssef, J., Dekadjevi, D. T., Pogossian, S. P., Jonnard, P., Le Guen, K., Gamblin, G., Rouvellou, B.
Format: Artikel
Sprache:eng
Schlagworte:
Condensed Matter
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
inter-diffusion
multi-layer structure
nickel aluminium
Physics
XES
XPS depth profile
XRD
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Zusammenfassung:Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated by Ni atoms. Moreover, the Ni diffusion results in the formation of an amorphous phase with a stoichiometry close to the Al3Ni aluminide. Copyright © 2008 John Wiley & Sons, Ltd.
ISSN:0142-2421
1096-9918
DOI:10.1002/sia.2896