N4-Methylation of Cytosine Drastically Favors the Formation of (6-4) Photoproducts in a TCG Context

Methylation of cytosine is a common biological process both in prokaryotic and eukaryotic cells. In addition to 5‐methylcytosine (5mC), some bacterial species contain in their genome N4‐methylcytosine (N4mC). Methylation at C5 has been shown to enhance the formation of pyrimidine dimeric photoproduc...

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Veröffentlicht in:Photochemistry and photobiology 2015-01, Vol.91 (1), p.102-108
Hauptverfasser: Douki, Thierry, Meador, Jarah A., Bérard, Izabel, Wack, Aude
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Sprache:eng
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Zusammenfassung:Methylation of cytosine is a common biological process both in prokaryotic and eukaryotic cells. In addition to 5‐methylcytosine (5mC), some bacterial species contain in their genome N4‐methylcytosine (N4mC). Methylation at C5 has been shown to enhance the formation of pyrimidine dimeric photoproducts but nothing is known of the effect of N4 methylation on UV‐induced DNA damage. In the present work, we compared the yield and the nature of bipyrimidine photoproducts induced in a series of trinucleotides exhibiting a TXG sequence where X is either T, C, 5mC or N4mC. HPLC associated to tandem mass spectrometry was used to quantify cyclobutane pyrimidine dimers (CPD), (6‐4) photoproducts (64PP) and their Dewar valence isomer. Methylation at position N4 was found to drastically increase the reactivity of C upon exposure to both UVC and UVB and to favor the formation of 64PP. In contrast methylation at C5 increased the yield of CPD at the expense of 64PP. In addition, enhancement of photoreactivity by C5 methylation was much higher in the UVB than in the UVC range. These results show the drastic effect of the methylation site on the photochemistry of cytosine. Methylation of cytosine at position C5 is known to favor the formation of UVB‐induced cyclobutane pyrimidine dimers in DNA. We report here that methylation at another position, namely the N4 exocyclic amino group, enhances the photoreactivity of cytosine both in the UVB and UVC range, and drastically increases the formation of (6‐4) photoproducts.
ISSN:0031-8655
1751-1097
0031-8655
DOI:10.1111/php.12365