Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces

In situ deposition of a thin (∼5 nm) layer of copper between Al and CuO layers is shown to increase the overall nanolaminate material reactivity. A combination of transmission electron microscopy imaging, in situ infrared spectroscopy, low energy ion scattering measurements, and first-principles cal...

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Veröffentlicht in:ACS applied materials & interfaces 2015-06, Vol.7 (22), p.11713-11718
Hauptverfasser: Marín, Lorena, Nanayakkara, Charith E, Veyan, Jean-Francois, Warot-Fonrose, Bénédicte, Joulie, Sébastien, Estève, Alain, Tenailleau, Christophe, Chabal, Yves J, Rossi, Carole
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Sprache:eng
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Zusammenfassung:In situ deposition of a thin (∼5 nm) layer of copper between Al and CuO layers is shown to increase the overall nanolaminate material reactivity. A combination of transmission electron microscopy imaging, in situ infrared spectroscopy, low energy ion scattering measurements, and first-principles calculations reveals that copper spontaneously diffuses into aluminum layers (substantially less in CuO layers). The formation of an interfacial Al:Cu alloy with melting temperature lower than pure Al metal is responsible for the enhanced reactivity, opening a route to controlling the stochiometry of the aluminum layer and increasing the reactivity of the nanoenergetic multilayer systems in general.
ISSN:1944-8244
1944-8252
DOI:10.1021/acsami.5b02653