Millijoule femtosecond micro-Bessel beams for ultra-high aspect ratio machining

We report on a functional experimental design for Bessel beam generation capable of handling high-energy ultrashort pulses (up to 1.2 mJ per pulse of 50 fs duration). This allows us to deliver intensities exceeding the breakdown threshold for air or any dielectric along controlled micro-filaments wi...

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Veröffentlicht in:Applied Optics 2015-08, Vol.54 (24), p.7358-7365
Hauptverfasser: Mitra, Sambit, Chanal, Margaux, Clady, Raphaël, Mouskeftaras, Alexandros, Grojo, David
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Sprache:eng
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Zusammenfassung:We report on a functional experimental design for Bessel beam generation capable of handling high-energy ultrashort pulses (up to 1.2 mJ per pulse of 50 fs duration). This allows us to deliver intensities exceeding the breakdown threshold for air or any dielectric along controlled micro-filaments with lengths exceeding 4 mm. It represents an unprecedented upscaling in comparison to recent femtosecond Bessel beam micromachining experiments. We produce void microchannels through glass substrates to demonstrate that aspect ratios exceeding 1200∶1 can be achieved by using single high-intensity pulses. This demonstration must lead to new methodologies for deep-drilling and high-speed cutting applications.
ISSN:0003-6935
1559-128X
2155-3165
1539-4522
DOI:10.1364/AO.54.007358