Electron cyclotron resonance plasma enhanced chemical vapour deposition and optical properties of SiOx thin films

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Bibliographische Detailangaben
Veröffentlicht in:	Journal of non-crystalline solids 1998-05, Vol.226 (1-2), p.58-66
Hauptverfasser:	BULKIN, P. V, SWART, P. L, LACQUET, B. M
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous semiconductors glasses Amorphous semiconductors glasses nanocrystalline materials Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Engineering Sciences Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics
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