Process monitoring of semiconductor thin film and interfaces by spectroellipsometry

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Veröffentlicht in:	Applied surface science 2000, p.283-290
Hauptverfasser:	Brenot, Romain, Drévillon, Bernard, Bulkin, Pavel, Roca I Cabarrocas, P., Vanderhagen, R.
Format:	Artikel
Sprache:	eng
Schlagworte:	Engineering Sciences
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container_end_page	290
container_issue
container_start_page	283
container_title	Applied surface science
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creator	Brenot, Romain Drévillon, Bernard Bulkin, Pavel Roca I Cabarrocas, P. Vanderhagen, R.
description
format	Article
fullrecord	<record><control><sourceid>hal</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_00915343v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>oai_HAL_hal_00915343v1</sourcerecordid><originalsourceid>FETCH-hal_primary_oai_HAL_hal_00915343v13</originalsourceid><addsrcrecordid>eNqVi8sKwjAUBYMoWB__cLcuCknTarsUUbpwIei-xDa1V_IoSRT691bwB1wNzJwzIRHLdzzOsjydkoiybRGnnCdzsvD-SSlLxhqR68XZWnoP2hoM1qF5gG3BS421Nc2rHh2EDg20qDQI0wCaIF0rxhfcB_C9rIOzUinsvdUyuGFFZq1QXq5_XJLN6Xg7lHEnVNU71MINlRVYlftz9XWUFizjKX8z_s_2Ay4-Ro0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Process monitoring of semiconductor thin film and interfaces by spectroellipsometry</title><source>Elsevier ScienceDirect Journals</source><creator>Brenot, Romain ; Drévillon, Bernard ; Bulkin, Pavel ; Roca I Cabarrocas, P. ; Vanderhagen, R.</creator><creatorcontrib>Brenot, Romain ; Drévillon, Bernard ; Bulkin, Pavel ; Roca I Cabarrocas, P. ; Vanderhagen, R.</creatorcontrib><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><language>eng</language><publisher>Elsevier</publisher><subject>Engineering Sciences</subject><ispartof>Applied surface science, 2000, p.283-290</ispartof><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0001-5591-3470 ; 0000-0001-5591-3470</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,4009</link.rule.ids><backlink>$$Uhttps://hal.science/hal-00915343$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Brenot, Romain</creatorcontrib><creatorcontrib>Drévillon, Bernard</creatorcontrib><creatorcontrib>Bulkin, Pavel</creatorcontrib><creatorcontrib>Roca I Cabarrocas, P.</creatorcontrib><creatorcontrib>Vanderhagen, R.</creatorcontrib><title>Process monitoring of semiconductor thin film and interfaces by spectroellipsometry</title><title>Applied surface science</title><subject>Engineering Sciences</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNqVi8sKwjAUBYMoWB__cLcuCknTarsUUbpwIei-xDa1V_IoSRT691bwB1wNzJwzIRHLdzzOsjydkoiybRGnnCdzsvD-SSlLxhqR68XZWnoP2hoM1qF5gG3BS421Nc2rHh2EDg20qDQI0wCaIF0rxhfcB_C9rIOzUinsvdUyuGFFZq1QXq5_XJLN6Xg7lHEnVNU71MINlRVYlftz9XWUFizjKX8z_s_2Ay4-Ro0</recordid><startdate>2000</startdate><enddate>2000</enddate><creator>Brenot, Romain</creator><creator>Drévillon, Bernard</creator><creator>Bulkin, Pavel</creator><creator>Roca I Cabarrocas, P.</creator><creator>Vanderhagen, R.</creator><general>Elsevier</general><scope>1XC</scope><orcidid>https://orcid.org/0000-0001-5591-3470</orcidid><orcidid>https://orcid.org/0000-0001-5591-3470</orcidid></search><sort><creationdate>2000</creationdate><title>Process monitoring of semiconductor thin film and interfaces by spectroellipsometry</title><author>Brenot, Romain ; Drévillon, Bernard ; Bulkin, Pavel ; Roca I Cabarrocas, P. ; Vanderhagen, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-hal_primary_oai_HAL_hal_00915343v13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Engineering Sciences</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Brenot, Romain</creatorcontrib><creatorcontrib>Drévillon, Bernard</creatorcontrib><creatorcontrib>Bulkin, Pavel</creatorcontrib><creatorcontrib>Roca I Cabarrocas, P.</creatorcontrib><creatorcontrib>Vanderhagen, R.</creatorcontrib><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Brenot, Romain</au><au>Drévillon, Bernard</au><au>Bulkin, Pavel</au><au>Roca I Cabarrocas, P.</au><au>Vanderhagen, R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Process monitoring of semiconductor thin film and interfaces by spectroellipsometry</atitle><jtitle>Applied surface science</jtitle><date>2000</date><risdate>2000</risdate><spage>283</spage><epage>290</epage><pages>283-290</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><pub>Elsevier</pub><orcidid>https://orcid.org/0000-0001-5591-3470</orcidid><orcidid>https://orcid.org/0000-0001-5591-3470</orcidid></addata></record>
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ispartof	Applied surface science, 2000, p.283-290
issn	0169-4332 1873-5584
language	eng
recordid	cdi_hal_primary_oai_HAL_hal_00915343v1
source	Elsevier ScienceDirect Journals
subjects	Engineering Sciences
title	Process monitoring of semiconductor thin film and interfaces by spectroellipsometry
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T10%3A56%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Process%20monitoring%20of%20semiconductor%20thin%20film%20and%20interfaces%20by%20spectroellipsometry&rft.jtitle=Applied%20surface%20science&rft.au=Brenot,%20Romain&rft.date=2000&rft.spage=283&rft.epage=290&rft.pages=283-290&rft.issn=0169-4332&rft.eissn=1873-5584&rft_id=info:doi/&rft_dat=%3Chal%3Eoai_HAL_hal_00915343v1%3C/hal%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true