Supercritical Fluid Chemical Deposition as an Alternative Process to CVD for the Surface Modification of Materials

Taking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to enable the fabrication of nanostructured devices. This paper gives information...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Chemical vapor deposition 2011-12, Vol.17 (10-12), p.342-352
Hauptverfasser:	Majimel, Mélanie, Marre, Samuel, Garrido, Elsa, Aymonier, Cyril
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical deposition Chemical Sciences Material chemistry Nanomaterials Supercritical fluids Surface modification
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!