Supercritical Fluid Chemical Deposition as an Alternative Process to CVD for the Surface Modification of Materials

Taking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to enable the fabrication of nanostructured devices. This paper gives information about the SFCD process for metal deposition as an alternative to CVD through various examples of inorganic deposition (films or nanostructures). In particular, the use of SFCD will be demonstrated for the surface modification of carbon nanotubes (CNTs) and their decoration with palladium nanoparticles. This short review aims at giving readers information about Supercritical Fluid Chemical Deposition process (SFCD) for metal deposition as an alternative and complementary process to CVD. In particular, we highlight different examples of inorganic deposition (films or nanostructures) on various substrates among which are carbon nanotubes (CNTs) or silicon nanopatterned substrates.