Chemical analysis of pulsed laser deposited a-CNx films by comparative infrared and X-ray photoelectron spectroscopies

Amorphous carbon nitride films are deposited at room temperature on silicon substrates by ArF excimer laser (193nm) ablation of a graphite target in nitrogen atmosphere. By tuning the process parameters, fine control of the carbon–carbon and carbon–nitrogen bond configuration is achieved in a broad...

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Veröffentlicht in:	Surface & coatings technology 2000-03, Vol.125 (1-3), p.308-312
Hauptverfasser:	Szörényi, T., Fuchs, C., Fogarassy, E., Hommet, J., Le Normand, F.
Format:	Artikel
Sprache:	eng
Schlagworte:	Carbon nitride Condensed Matter Cross-disciplinary physics: materials science rheology Exact sciences and technology Infrared (IR) absorption spectroscopy Laser deposition Materials Science Methods of deposition of films and coatings film growth and epitaxy Physics Pulsed laser deposition X-ray photoelectron spectroscopy (XPS)
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