DIELECTRIC PROPERTIES AT MICROWAVES FREQUENCIES OF (Ni, Ti, La, Mg)-DOPED Ba0.3Sr0.7TiO3 THIN FILMS DEPOSITED ON HIGH-RESISTIVITY SILICON SUBSTRATES

Pure and doped Ba0.3Sr0.7TiO3 thin films are deposited by radio frequency magnetron sputtering using the in-situ process on high-resistivity silicon substrates. Four dopants, La, Ti, Mg, and Ni with different concentrations from 1 to 5 mol%, were studied. The permittivity, dielectric losses, and tun...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of the American Ceramic Society 2011-01, Vol.94 (6), p.1661-1663
Hauptverfasser: Ponchel, F, Remiens, D, Midy, J, Legier, J-F, Soyer, C, Lasri, T, Guegan, G
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Pure and doped Ba0.3Sr0.7TiO3 thin films are deposited by radio frequency magnetron sputtering using the in-situ process on high-resistivity silicon substrates. Four dopants, La, Ti, Mg, and Ni with different concentrations from 1 to 5 mol%, were studied. The permittivity, dielectric losses, and tunability were determined up to 60 GHz using a coplanar waveguide. The difficulty of simultaneously improving these electrical properties, particularly the loss tangent and tunability, is highlighted. The best improvement was obtained for 5 mol% La for which the losses were in the order of 7.4%, the tunability and the figure of merit were around 29% and 3.9%, respectively, at 60 GHz.
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1551-2916.2011.04546.x