Performance predictions of interconnect networks for advanced technology nodes
New materials are required for upcoming technologies to maintain good performance levels and increase circuit lifetime. Predictive simulations are thus performed looking at several fundamental barriers and restoration treatments in order to achieve good signal propagation and strong reliability for...
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Veröffentlicht in: | Microelectronic engineering 2010-03, Vol.87 (3), p.321-323 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | New materials are required for upcoming technologies to maintain good performance levels and increase circuit lifetime. Predictive simulations are thus performed looking at several fundamental barriers and restoration treatments in order to achieve good signal propagation and strong reliability for integrated circuits. Precise recommendations are finally proposed for both 32
nm and 22
nm technology nodes. |
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ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/j.mee.2009.09.003 |