Gas-liquid selective oxidations with oxygen under explosive conditions in a micro-structured reactor

The gas-liquid oxidation of cyclohexane is performed at high temperature (>200 degrees C) and pressure (up to 25 bar) using pure oxygen in a Pyrex capped silicon etched microreactor which allows convenient screen reaction conditions well above the flammability limit.

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Bibliographische Detailangaben
Veröffentlicht in:	Lab on a chip 2008-01, Vol.8 (5), p.814-817
Hauptverfasser:	Leclerc, Arnaud, Alamé, Mohamad, Schweich, Daniel, Pouteau, Patrick, Delattre, Cyril, de Bellefon, Claude
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical engineering Chemical Sciences Cyclohexanes - chemistry Explosive Agents - chemistry Gases - chemistry Ligands Microfluidic Analytical Techniques - instrumentation Microfluidic Analytical Techniques - methods Molecular Structure Oxidation-Reduction Oxygen - chemistry Particle Size Pressure Sensitivity and Specificity Silicon - chemistry Temperature
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Beschreibung
Zusammenfassung:	The gas-liquid oxidation of cyclohexane is performed at high temperature (>200 degrees C) and pressure (up to 25 bar) using pure oxygen in a Pyrex capped silicon etched microreactor which allows convenient screen reaction conditions well above the flammability limit.
ISSN:	1473-0197 1473-0189
DOI:	10.1039/b717985e