Photochemical oxidation of hydrogenated boron-doped diamond surfaces

We describe the photochemical oxidation of polycrystalline boron-doped diamond films by UV irradiation in air at room temperature. The reaction generates surface hydroxyl groups that have been coupled with perfluorodecyl trichlorosilane to yield an organic layer covalently attached to the diamond su...

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Veröffentlicht in:	Electrochemistry communications 2005-09, Vol.7 (9), p.937-940
Hauptverfasser:	Boukherroub, Rabah, Wallart, Xavier, Szunerits, Sabine, Marcus, Bernadette, Bouvier, Pierre, Mermoux, Michel
Format:	Artikel
Sprache:	eng
Schlagworte:	Boron-doped polycrystalline diamond Chemical Sciences Clean metal, semiconductor, and insulator surfaces Condensed matter: electronic structure, electrical, magnetic, and optical properties Electrochemical properties Electron and ion emission by liquids and solids impact phenomena Exact sciences and technology Material chemistry Photochemical oxidation Photoemission and photoelectron spectra Physics Surface chemical reactivity
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Beschreibung
Zusammenfassung:	We describe the photochemical oxidation of polycrystalline boron-doped diamond films by UV irradiation in air at room temperature. The reaction generates surface hydroxyl groups that have been coupled with perfluorodecyl trichlorosilane to yield an organic layer covalently attached to the diamond surface. The resulting surfaces were characterized using X-ray photoelectron spectroscopy, contact angle and cyclic voltammetry.
ISSN:	1388-2481 1873-1902
DOI:	10.1016/j.elecom.2005.05.010