Molecular hydrogen formation in hydrogenated silicon nitride

Hydrogen is released from hydrogenated silicon nitride ( Si N x : H ) during thermal treatments. The formation of molecular hydrogen ( H 2 ) in Si N x : H layers with low mass density is confirmed by Raman spectroscopy. However, no H 2 is observed in layers with a high mass density despite clear evi...

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Veröffentlicht in:	Applied physics letters 2006-11, Vol.89 (21), p.211914-211914-3
Hauptverfasser:	Dekkers, H. F. W., Beaucarne, G., Hiller, M., Charifi, H., Slaoui, A.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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