Characterization of rf sputtered TiOySz thin films

Different titanium oxysulfide thin films were prepared by rf magnetron sputtering using two types of targets in a pure argon or mixed oxygen/argon atmosphere with a total pressure of 1 or 0*2 Pa. We have studied the influence of the sputtering conditions (target, total pressure, oxygen partial press...

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Veröffentlicht in:	Thin solid films 2005-07, Vol.484 (1-2), p.113-123
Hauptverfasser:	LINDIC, Marie-Hélène, PECQUENARD, Brigitte, VINATIER, Philippe, LEVASSEUR, Alain, MARTINEZ, Hervé, GONBEAU, Danielle, PETIT, Pierre-Emmanuel, OUVRARD, Guy
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical Sciences Condensed Matter Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Material chemistry Materials Science Methods of deposition of films and coatings film growth and epitaxy Physics
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