Highly doped silicon nanowires based electrodes for micro-electrochemical capacitor applications

Highly doped (both n and p-type dopings) silicon nanowires (SiNWs) have been deposited via Chemical Vapor Deposition and investigated as electrode materials for micro-capacitor in a standard organic based electrolyte. Silicon nanostructuration enables to increase areal capacitance. Double layer capa...

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Veröffentlicht in:Electrochemistry communications 2012-11, Vol.25, p.109-111
Hauptverfasser: Thissandier, Fleur, Le Comte, Annaïg, Crosnier, Olivier, Gentile, Pascal, Bidan, Gérard, Hadji, Emmanuel, Brousse, Thierry, Sadki, Saïd
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Sprache:eng
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Zusammenfassung:Highly doped (both n and p-type dopings) silicon nanowires (SiNWs) have been deposited via Chemical Vapor Deposition and investigated as electrode materials for micro-capacitor in a standard organic based electrolyte. Silicon nanostructuration enables to increase areal capacitance. Double layer capacitance values up to 46μF·cm−2 have been measured. Micro capacitors based on two SiNWs electrodes exhibit an excellent cycling ability and power density as high as 1.6mW·cm−2. ► Highly doped silicon nanowires were investigated for micro-electrochemical capacitor. ► Double layer capacitance values of 34-46µF/cm2. ► Nanostructuration of Silicon NanoWires (SiNWs) has been emphasized. ► n/p-doped SiNWs exhibits excellent cyclability with power density of 1.6mW/cm2.
ISSN:1388-2481
1873-1902
DOI:10.1016/j.elecom.2012.09.019