Amoxicillin Degradation by TiO[sub.2] P25 Solar Heterogeneous Photocatalysis: Influence of pH and Oxidizing Agent H[sub.2]O[sub.2] Addition

Over the years, there has been an increase in the consumption of drugs, particularly antibiotics. Amoxicillin (AMX) is considered one of the most widely used antibiotics, causing resistance in microorganisms in the ecosystem where it is found. Additionally, it has been cataloged among the drugs unde...

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Veröffentlicht in:Applied sciences 2023-07, Vol.13 (13)
Hauptverfasser: Alcázar-Medina, Tania L, Chairez-Hernández, Isaías, Lemus-Santana, Ana A, Núñez-Núñez, Cynthia M, Proal-Nájera, José B
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Sprache:eng
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Zusammenfassung:Over the years, there has been an increase in the consumption of drugs, particularly antibiotics. Amoxicillin (AMX) is considered one of the most widely used antibiotics, causing resistance in microorganisms in the ecosystem where it is found. Additionally, it has been cataloged among the drugs under surveillance by the European Commission since 2020. The present work studies the efficiency of AMX degradation by photolysis and heterogeneous solar photocatalysis processes under different reaction pH levels (3.5, 4.15, 7 and 9) and observing the influence of different doses of H[sub.2]O[sub.2] (nil and 4 mM), as an oxidizing agent. TiO[sub.2] P25 was used as photocatalyst, impregnated in glass supports of 0.1 and 1 m[sup.2] in flat plate reactors (FPR). A 2 × 2 × 4 statistical analysis carried out after repeated measurements to determine the relationship between the different parameters involved (process, H[sub.2]O[sub.2] dose, and pH). The kinetics of the AMX degradation reaction showed the best rate constant (K[sub.phC] = 0.10 min[sup.−1]) under acidic medium conditions (pH 4.15), without addition of H[sub.2]O[sub.2], and by heterogeneous photocatalysis when using a 1 m[sup.2] FPR to achieve 100% COD removal. ANCOVA showed significant differences (p < 0.05) in the use of H[sub.2]O[sub.2] for the first minutes of the reaction and in the different FPR surfaces.
ISSN:2076-3417
2076-3417
DOI:10.3390/app13137857