Empirical-based modeling for control of CMP removal uniformity

Empirical-based modeling for control of CMP removal uniformity

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Veröffentlicht in:Solid state technology 2001-06, Vol.44 (6), p.101
Hauptverfasser: Jensen, Alan, Renteln, Peter, Jew, Stephen, Raeder, Chris, Cheung, Patrick
Format: Magazinearticle
Sprache:eng
Schlagworte:
Analysis
Manufacturing processes
Production management
Semiconductor industry
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container_end_page
container_issue 6
container_start_page 101
container_title Solid state technology
container_volume 44
creator Jensen, Alan
Renteln, Peter
Jew, Stephen
Raeder, Chris
Cheung, Patrick
description
format Magazinearticle
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source EBSCOhost Business Source Complete
subjects Analysis
Manufacturing processes
Production management
Semiconductor industry
title Empirical-based modeling for control of CMP removal uniformity
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