IBM advanced lithography facility : The first five years
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| Veröffentlicht in: | Solid state technology 1998-07, Vol.41 (7), p.101-115 |
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| Hauptverfasser: | , |
| Format: | Magazinearticle |
| Sprache: | eng |
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| container_end_page | 115 |
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| container_issue | 7 |
| container_start_page | 101 |
| container_title | Solid state technology |
| container_volume | 41 |
| creator | LESOINE, L. G LEAVEY, J. A |
| description | |
| format | Magazinearticle |
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| fulltext | fulltext |
| identifier | ISSN: 0038-111X |
| ispartof | Solid state technology, 1998-07, Vol.41 (7), p.101-115 |
| issn | 0038-111X |
| language | eng |
| recordid | cdi_gale_infotracmisc_A21188562 |
| source | Business Source Complete |
| subjects | Applied sciences Buildings and facilities Design. Technologies. Operation analysis. Testing Electromagnetism electron and ion optics Electronics Exact sciences and technology Fundamental areas of phenomenology (including applications) Integrated circuits Physics Radiation by moving charges Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Semiconductor industry Synchrotron radiation |
| title | IBM advanced lithography facility : The first five years |
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