IBM advanced lithography facility : The first five years

IBM advanced lithography facility : The first five years

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Veröffentlicht in:Solid state technology 1998-07, Vol.41 (7), p.101-115
Hauptverfasser: LESOINE, L. G, LEAVEY, J. A
Format: Magazinearticle
Sprache:eng
Schlagworte:
Applied sciences
Buildings and facilities
Design. Technologies. Operation analysis. Testing
Electromagnetism
electron and ion optics
Electronics
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Integrated circuits
Physics
Radiation by moving charges
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Semiconductor industry
Synchrotron radiation
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ISSN:0038-111X