Silicon-rich-methacrylate bilayer resist for 193-nm lithography
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| Veröffentlicht in: | Solid state technology 1998-06, Vol.41 (6), p.69-79 |
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| container_end_page | 79 |
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| container_issue | 6 |
| container_start_page | 69 |
| container_title | Solid state technology |
| container_volume | 41 |
| creator | BLAKENEY, A GABOR, A WHITE, D STEINHÄUSLER, T DEADY, W JARMALOWICZ, J KUNZ, R DEAN, K RICH, G STARK, D |
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| format | Magazinearticle |
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| fulltext | fulltext |
| identifier | ISSN: 0038-111X |
| ispartof | Solid state technology, 1998-06, Vol.41 (6), p.69-79 |
| issn | 0038-111X |
| language | eng |
| recordid | cdi_gale_infotracmisc_A21188484 |
| source | Business Source Complete |
| subjects | Analysis Electronics industry Equipment and supplies Exact sciences and technology Photolithography Photoresists Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications |
| title | Silicon-rich-methacrylate bilayer resist for 193-nm lithography |
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