High-resolution profilometry for CMP process control
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| Veröffentlicht in: | Solid state technology 1997-06, Vol.40 (6), p.203-210 |
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| Hauptverfasser: | , , |
| Format: | Magazinearticle |
| Sprache: | eng |
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| container_end_page | 210 |
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| container_issue | 6 |
| container_start_page | 203 |
| container_title | Solid state technology |
| container_volume | 40 |
| creator | SCHNEIR, J JOBE, R TSAI, V. W |
| description | |
| format | Magazinearticle |
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| fulltext | fulltext |
| identifier | ISSN: 0038-111X |
| ispartof | Solid state technology, 1997-06, Vol.40 (6), p.203-210 |
| issn | 0038-111X |
| language | eng |
| recordid | cdi_gale_infotracmisc_A19780698 |
| source | Business Source Complete |
| subjects | Applied sciences Electronics Exact sciences and technology High resolution spectroscopy Innovations Microelectronic fabrication (materials and surfaces technology) Process control Production management Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Semiconductor wafers |
| title | High-resolution profilometry for CMP process control |
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