TiO[sub.2]-Coated Meltblown Nonwoven Fabrics Prepared via Atomic Layer Deposition for the Inactivation of IE. coli/I as a Model Photocatalytic Drinking Water Treatment System

The controlled manufacturing of semiconductor photocatalysts is crucial to their development for drinking water treatment. In this study, TiO[sub.2] -coated meltblown nonwoven fabrics prepared via Atomic Layer Deposition (ALD) are applied for the inactivation of Escherichia coli (E. coli ). It is observed that in the presence of an ultraviolet light-emitting diode (UV-LED) light source (255 nm), 1.35 log E. coli inactivation is achieved. However, exposure to catalyst-coated fabrics in addition to the light source resulted in >4 log E. coli inactivation, suggesting a much higher rate of hydroxyl radical formation on the surface, leading to cell death.