DISPERSION PROPERTIES OF [.sub.2][O.sub.3] THIN FILMS

We have studied the refractive index dispersion in [([Y.sub.0.06][Ga.sub.0.94]).sub.2][O.sub.3] thin films obtained by high- frequency ion plasma sputtering. We show that the films are formed with mixed orientation, and the maxima of the diffraction patterns correspond to the monoclinic crystal structure of [beta]-[Ga.sub.2][O.sub.3]. We have established that as for [beta]-[Ga.sub.2][O.sub.3] films, we observe anomalous dispersion in the near UV region for ([Y.sub.0.06][Ga.sub.0.94]).sub.2][O.sub.3] films annealed in hydrogen, while we observe normal dispersion for films annealed in oxygen or argon. For the studied films with normal dispersion, we compare two single-oscillator approximation models, and we find the parameters of the approximation, the dispersion energy, the chemical bond ionicity, the coordination number, the static refractive index, the characteristic wavelength for UV absorption, and the average oscillator absorption energy. We established that the static refractive index in the studied films increases as the number of oxygen vacancies increases, and that it is inversely proportional to the average oscillator absorption energy.