Electrochemical preparation of Co-Cu alloy nanowires and their characterisation

In this study, Co-Cu alloy nanowires were grown in anodic aluminium oxide (AAO) template obtained through one-step anodisation method of aluminium-magnesium alloy (Al 95%) in oxalic acid solution at constant voltage of 40 V. The electrodeposition of Co-Cu alloy nanowires into the 10 pm thickness of AAO template with pore average diameter of 40 nm was studied using a single bath containing both cobalt and copper ions. The galvanostatic reverse pulse plating was chosen as preparation method of Co-Cu alloy nanowires at room temperature. The optimal operation parameters required during the preparation method were established by cyclic voltammetry (CV) experiments. The electrochemical deposition was performed at current densities ranging between 20-50 mA/[cm.sup.2] during 60 min. The physical and chemical properties of Co-Cu alloy nanowires have been investigated through scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDS), X-ray fluorescence spectroscopy (XRF) and focused-ion-beam-microscopy (FIB) techniques. Keywords: Al, anodisation, AAO template, Co-Cu alloy nanowires, electrodeposition, reverse pulse plating, FIB, TEM.