IR spectral characteristics of lithium hydride thin films

Lithium hydride thin films were deposited by pulsed laser deposition and structurally characterized by means of IR spectra. The pressure of H 2 used as a reactive gas was changed and the substrate temperature, substrate- target distance, laser fluence, and other conditions were defined. The research result shows that the pressure of H 2 is an important factor that affects the quality of lithium hydride films. With increase in hydrogen gas pressure, the H 2 content in the films rises and peak maxima of the Li–H bond move to higher wave numbers.