Features of impurity-photoconductivity relaxation in boron-doped silicon

A series of studies of the impurity-photoconductivity relaxation in Si:B is carried out under pulse optical excitation by a narrow-band tunable radiation source in low and “heating” (10–500 V/cm) electric fields. It is shown that the dependence of the carrier-capture time in a band on the applied el...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2012-11, Vol.46 (11), p.1387-1391
Hauptverfasser: Rumyantsev, V. V., Morozov, S. V., Kudryavtsev, K. E., Gavrilenko, V. I., Kozlov, D. V.
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Sprache:eng
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Zusammenfassung:A series of studies of the impurity-photoconductivity relaxation in Si:B is carried out under pulse optical excitation by a narrow-band tunable radiation source in low and “heating” (10–500 V/cm) electric fields. It is shown that the dependence of the carrier-capture time in a band on the applied electric field is nonmonotonic and, in high fields (>75 V/cm), the capture time decreases with increasing field intensity, which is related to initiating the relaxation processes with optical-phonon emission within the band. The dependence of the relaxation rate for the carriers on the excitation-radiation wavelength is investigated, and a decrease in the carrier-capture time in the band is revealed in the vicinity of the Breit-Wigner-Fano resonances caused by direct capture at an impurity with optical-phonon emission.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782612110188