Epitaxial growth and properties of [Mg.sub.x][Zn.sub.1-x]O films produced by pulsed laser deposition
The [Mg.sub.x][Zn.sub.1-x]O thin films with a Mg content corresponding to x = 0- 0.45 are grown by pulsed laser deposition on ablation of ceramic targets. The conditions for epitaxial growth of the films on the single-crystal [Al.sub.2][O.sub.3] (00.1) substrates are established. The record limit of...
Gespeichert in:
Veröffentlicht in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2010-02, Vol.44 (2), p.246 |
---|---|
Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The [Mg.sub.x][Zn.sub.1-x]O thin films with a Mg content corresponding to x = 0- 0.45 are grown by pulsed laser deposition on ablation of ceramic targets. The conditions for epitaxial growth of the films on the single-crystal [Al.sub.2][O.sub.3] (00.1) substrates are established. The record limit of solubility of Mg in hexagonal ZnO, x = 35 is attained. In this case, the lattice mismatch for the parameter a of the ZnO and [Mg.sub.0.35][Zn.sub.0.65]O films does not exceed 1%, whereas the band gaps of the films differ by O.78 eV The surface roughness of the films corresponds to 0.8-1.5 nm in the range of x = 0-0.27. DOI: 10.1134/S106378261002020X |
---|---|
ISSN: | 1063-7826 |
DOI: | 10.1134/S106378261002020X |