The composition and structure of interphase boundaries of III–V semiconductors formed in a liquid medium

By the example of indium antimonide and gallium and indium arsenides, a possible mechanism of the formation, composition, and structure of a surface phase layer and a near-surface (transition) crystalline layer with a disturbed structure is considered for semiconductor compounds after chemical treat...

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Veröffentlicht in:Russian physics journal 2012-05, Vol.54 (12), p.1375-1383
Hauptverfasser: Zarubina, O. N., Mokrousov, G. M., Naiden, E. P.
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creator Zarubina, O. N.
Mokrousov, G. M.
Naiden, E. P.
description By the example of indium antimonide and gallium and indium arsenides, a possible mechanism of the formation, composition, and structure of a surface phase layer and a near-surface (transition) crystalline layer with a disturbed structure is considered for semiconductor compounds after chemical treatment. Assuming the maximum allowable deviation from the stoichiometric ratio of the components within the homogeneity range of compounds and diffusion, a possible thickness of the crystalline near-surface layer is estimated. The theoretical calculations were experimentally verified using X-ray diffraction.
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subjects Condensed Matter Physics
Hadrons
Heavy Ions
Lasers
Mathematical and Computational Physics
Nuclear Physics
Optical Devices
Optics
Photonics
Physics
Physics and Astronomy
Semiconductors
Theoretical
Thermodynamics
title The composition and structure of interphase boundaries of III–V semiconductors formed in a liquid medium
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