Electron spectroscopy of the nanostructures created in Si, GaAs, and Ca[F.sub.2] surface layers using low-energy ion implantation

A review of the experimental results on the study of the Si, GaAs, and Ca[F.sub.2] surface layers that are created using the low-energy ion implantation is presented. Optical and electron spectroscopy and microscopy are employed in the experiments. DOI: 10.1134/S1063784213060261

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Technical physics 2013-06, Vol.58 (6), p.841
Hauptverfasser: Umirzakov, B.E, Tashmukhamedova, D.A, Muradkabilov, D.M, Boltaev, Kh. Kh
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A review of the experimental results on the study of the Si, GaAs, and Ca[F.sub.2] surface layers that are created using the low-energy ion implantation is presented. Optical and electron spectroscopy and microscopy are employed in the experiments. DOI: 10.1134/S1063784213060261
ISSN:1063-7842
DOI:10.1134/S1063784213060261