Electron spectroscopy of the nanostructures created in Si, GaAs, and Ca[F.sub.2] surface layers using low-energy ion implantation
A review of the experimental results on the study of the Si, GaAs, and Ca[F.sub.2] surface layers that are created using the low-energy ion implantation is presented. Optical and electron spectroscopy and microscopy are employed in the experiments. DOI: 10.1134/S1063784213060261
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Veröffentlicht in: | Technical physics 2013-06, Vol.58 (6), p.841 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A review of the experimental results on the study of the Si, GaAs, and Ca[F.sub.2] surface layers that are created using the low-energy ion implantation is presented. Optical and electron spectroscopy and microscopy are employed in the experiments. DOI: 10.1134/S1063784213060261 |
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ISSN: | 1063-7842 |
DOI: | 10.1134/S1063784213060261 |