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WO2003087426 A UPAB: 20031120 NOVELTY - A coating device has a cathode chamber (3) and a substrate chamber (4) each having a direct suction outlet (10, 16) and a gas feed (8, 14). The gas feed (8) into the cathode chamber is connected to a process gas source (9) and the gas feed (14) for the substra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Geisler, M, Kastner, A, Szyszka, B, Pflug, A, Malkomes, N
Format: Patent
Sprache:ger
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Beschreibung
Zusammenfassung:WO2003087426 A UPAB: 20031120 NOVELTY - A coating device has a cathode chamber (3) and a substrate chamber (4) each having a direct suction outlet (10, 16) and a gas feed (8, 14). The gas feed (8) into the cathode chamber is connected to a process gas source (9) and the gas feed (14) for the substrate chamber is connected to a reactive gas source (15). USE - Used for coating processes. ADVANTAGE - Complete reaction of the layer to be formed is achieved without the target surface reacting with the reactive gas in an unwanted manner.