Verfahren zur Erzeugung metallisch kristalliner Oberflaechenstrukturen im Wege einer galvanischen Metallabscheidung

DE 102009006282 A1 UPAB: 20100806 NOVELTY - The method for producing metallic crystalline surface structure by galvanic metal deposition on an electrode surface that is arranged within an electrolyte fluid (3) against a counter electrode containing metal to be deposited, comprises horizontally arranging the electrode surface and a surface associated to the counter electrode in such a way that the electrode- and counter electrode surfaces rest relative to the electrolyte fluid. Electric voltage is applied between the electrode- and counter electrode surfaces in which a layer is formed within the electrolyte fluid with a layer thickness. DETAILED DESCRIPTION - The method for producing metallic crystalline surface structure by galvanic metal deposition on an electrode surface that is arranged within an electrolyte fluid (3) against a counter electrode containing metal to be deposited, comprises horizontally arranging the electrode surface and a surface associated to the counter electrode in such a way that the electrode- and counter electrode surfaces rest relative to the electrolyte fluid. Electric voltage is applied between the electrode- and counter electrode surfaces in which a layer is formed within the electrolyte fluid with a layer thickness extending itself orthogonal to electrode surface, adjacent to the electrode surface. A convection flow forms within the electrode surface and is initiated subsequently through a concentration gradient induced by metal ions and oriented orthogonal to electrode surface, and through a density gradient. Depletion induced through deposition on the electrode surface adjusts on metal ions directly at the electrode surface adjacent within the electrolyte fluid. The metal ion concentration uniformly increases with increasing orthogonal interval to electrode surface within the layer. The concentration gradient is uniformly distributed over the total electrode surface. The electrolyte fluid and/or electrode and/or counter electrode are held respectively at same temperature. The convection flow forms itself exclusively under gravity condition, and the electrode surface is oriented vertically to gravity vector. The surface of semiconductor wafer, a glass substrate or a film is used as electrode surface. A layer from electrically insulated materials is section-wisely applied on the electrode surface. The metal is heavy metal and/or its alloy, non-ferrous metal and element of subgroup such as gold and silver. The metallic crystal