Inorganic oxidant compositions for removing contaminants

A composition for removing contaminants from a chosen solid substrate while avoiding negative environmental impact comprises: (a) an oxidizer selected from the group of (1) oxidizing agents which generate hydrogen peroxide upon dissolution in water, the oxidizing agent present in an amount sufficient to generate from about 0.01 percent by weight of hydrogen peroxide based on the composition up to the solubility limit of the oxidizing agent in the composition, and (2) salts of halogen oxy-acids, present in an amount from about 0.01 percent by weight of the composition up to the solubility limit of the salt of the halogen oxy-acid in the composition; (b) an alkaline compound in sufficient amount to provide a pH of 7.0 or higher in the composition; (c) about 0.01 to 5.0 percent by weight of a chosen wetting agent which is unreactive with the oxidizer and the alkaline compound; and (d) deionized water as the balance of said composition. Optionally, the composition may further comprise about 0.01 to 10.0 percent by weight of a chosen materials protective agent. In operation, the solid substrate having contaminants thereon is exposed to the above-noted composition whereby the contaminants are removed from the substrate and are converted into non-toxic and non-hazardous products. In an alternative embodiment, contaminant removal is further enhanced by exposing the composition and the contaminants on the substrate to ultraviolet radiation.