SKIN CLEANSING COMPOSITION
Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5. |
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